Dapan Li

Title: Dapan Li and Avalanche Photodiode Innovation

Introduction

Dapan Li is an inventor associated with Shenzhen, China, and Huawei Technologies Co., Ltd. His listed patent concerns avalanche photodiode (APD) design and fabrication, with potential applications in detectors and laser radar systems.

Latest Patents

The provided information lists one patent for Dapan Li: “APD, APD Fabrication Method, Detector, and Laser Radar System.” The invention describes an APD with vertically arranged gain, gradient, and absorption layers between a buffer layer and a diffusion barrier layer. Its gain layer contains at least two stacked gain units, each comprising a multiplication layer and a charge layer. The charge layer is positioned closer to the gradient layer than the multiplication layer is. The described structure relates to photodetection and laser radar technology.

Career Highlights

Li is associated with Huawei Technologies Co., Ltd., a company active in technology development. The available details identify his work through the APD patent and do not provide further information about his role or career history. The listed patent count is 1 patent.

Collaborations

The provided information names Hongming Shen and Yanli Zhao as Li’s coworkers. It does not specify their roles in the patent or describe particular collaborative contributions.

Conclusion

Dapan Li’s listed patent focuses on a layered avalanche photodiode architecture intended for detector and laser radar applications. It represents the available record of his identified invention and association with Huawei Technologies Co., Ltd.