Shenzhen, China

Daoyou Peng

This inventor holds 1 USPTO granted patent. Top assignee: Aputure Imaging Industries Co., Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Daoyou Peng. Retrieved from https://idiyas.com/inventor/daoyou-peng-h8b0vje3

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Daoyou Peng and His Lighting Innovation.

Introduction

Daoyou Peng is an inventor based in Shenzhen, China, associated with Aputure Imaging Industries Co., Ltd. His patent work includes an invention focused on lighting apparatus and lighting systems.

Latest Patents

The provided information lists one patent for Peng: Lighting Apparatus and Lighting System. The invention describes a housing containing a light source module, a diffusion shield spaced apart from the module, and end covers connected to the housing and shield. The diffusion shield has a first diffusion wall and two second diffusion walls. Each second diffusion wall includes a light-transmitting area connected to the first diffusion wall and a light-shading area positioned farther from it. Light from the source module exits through the first diffusion wall and the light-transmitting areas. Peng’s listed patent portfolio comprises 1 patent.

Career Highlights

Peng’s documented innovation concerns the design of a lighting apparatus and system, particularly the arrangement of diffusion and shading areas to manage emitted light. The supplied information identifies Aputure Imaging Industries Co., Ltd. as his company.

Collaborations

Weisong Zhang and Huaiyou Mo are identified as Peng’s coworkers. The provided details do not specify their roles in the patent or the nature of their collaboration.

Conclusion

Daoyou Peng’s listed patent reflects an engineering contribution to lighting design through a diffusion shield that combines light-transmitting and light-shading areas.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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