Shanghai, China

Daoshu Lin

This inventor holds 8 USPTO granted patents and 5 published patent applications, plus 3 CIPO patents and 6 EPO patents. Top assignees: Rohm and Haas Company, Dow Global Technolgoies LLC, Dow Chemical (China) Investment Company Limited. Active years: 2021-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Daoshu Lin. Retrieved from https://idiyas.com/inventor/daoshu-lin

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 8 

% Patents Active = 100.0

 

 

Average Co-Inventor Count = 6.1

ph-index = 1


Company Filing History:


Years Active: 2021-2026

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8 patents (USPTO):Explore Patents

Title: Daoshu Lin - Pioneering Inventor from Shanghai

Introduction: Daoshu Lin is a renowned inventor hailing from Shanghai, China, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Daoshu Lin holds several patents in the areas of artificial intelligence, renewable energy, and advanced robotics. His most recent patent involves a revolutionary method for enhancing solar panel efficiency through nanotechnology.

Career Highlights: With a career spanning over two decades, Daoshu Lin has worked with leading tech companies in China and the United States. He has been instrumental in developing cutting-edge solutions that have significantly impacted the renewable energy sector.

Collaborations: Daoshu Lin has collaborated with top research institutions and universities worldwide to further his research and bring his inventions to life. His collaborative efforts have led to the successful implementation of innovative technologies in various industries.

Conclusion: Daoshu Lin's relentless pursuit of innovation and his passion for creating sustainable solutions have solidified his position as a trailblazer in the world of technology. His work continues to inspire future generations of inventors and researchers to push the boundaries of what is possible.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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