Shaanxi, China

Danyang Wan

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Xi'an Modern Chemistry Research Institute. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Danyang Wan. Retrieved from https://idiyas.com/inventor/danyang-wan

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

 

Average Co-Inventor Count = 11.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Danyang Wan: Innovator in Liquid Crystal Technology

Introduction

Danyang Wan is a prominent inventor based in Shaanxi, China. He has made significant contributions to the field of liquid crystal technology. His innovative work has led to the development of a unique liquid crystal composition that boasts extremely low dielectric loss.

Latest Patents

Danyang Wan holds a patent for a liquid crystal (LC) composition with extremely low dielectric loss and a high-frequency component that includes the same. This patent, which is crucial for advancements in electronic components, showcases his expertise in the field. The LC composition comprises one or more selected from compounds shown in structural formula (I) and one or more selected from compounds shown in structural formula (II).

Career Highlights

Danyang Wan is affiliated with the Xi'an Modern Chemistry Research Institute, where he continues to push the boundaries of liquid crystal research. His work has garnered attention for its potential applications in various high-frequency technologies.

Collaborations

Danyang has collaborated with notable colleagues, including Jian Li and Minggang Hu, who share his passion for advancing liquid crystal technology. Their combined efforts contribute to the innovative environment at the research institute.

Conclusion

Danyang Wan's contributions to liquid crystal technology exemplify the spirit of innovation. His patent and ongoing research are paving the way for future advancements in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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