Company Filing History:
Years Active: 2017-2018
Title: Dantao Wang: Innovator in Zone Melting Technology
Introduction
Dantao Wang is a notable inventor based in Shangyu, China. He has made significant contributions to the field of zone melting technology, particularly in the development of devices that enhance the growth process of silicon single crystals. With a total of 2 patents, his work addresses critical challenges in the industry.
Latest Patents
Wang's latest patents include an "Auxiliary heating device for zone melting furnace" and a "heat preservation method for single crystal rod thereof." The auxiliary heating device is designed to improve the thermal field distribution within a zone melting furnace, which is crucial for preventing the cracking of single crystal rods during the growth process. This device features an auxiliary heater positioned below a high-frequency heating coil, which is constructed from a hollow metal circular pipe. The innovative design aims to mitigate thermal stress and enhance the quality of silicon single crystals over 6.5 inches.
Another significant patent is the "Zone melting furnace thermal field with dual power heating function and heat preservation method." This invention incorporates a primary heating coil and an auxiliary heater with a unique wavy design. The dual power heating function aims to improve thermal field distribution, thereby reducing the risk of cracking in single crystal rods during the growth of both 3-6 inch and larger silicon single crystals.
Career Highlights
Dantao Wang is currently employed at Zhejiang Jingsheng M & E Co., Ltd., where he continues to innovate in the field of materials engineering. His work has been instrumental in advancing technologies that support the semiconductor industry.
Collaborations
Wang collaborates with talented colleagues, including Linjian Fu and Penggen Ouyang, who contribute to the research and development efforts at their company.
Conclusion
Dantao Wang's contributions to zone melting technology exemplify the importance of innovation in the semiconductor industry. His patents not only address existing challenges but also pave the way for future advancements in the field.