Danping Peng

Title: The Innovations of Danping Peng

Introduction

Danping Peng is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of optical systems and lithography. With a total of 2 patents, his work focuses on enhancing layout patterns and modeling masks with complex geometries.

Latest Patents

One of his latest patents is titled "Multi-component kernels for vector optical image simulation." This method enhances a layout pattern by determining a vector transmission cross coefficient (vector-TCC) operator of an optical system. It involves performing an optical proximity correction (OPC) operation on a layout pattern of a photo mask to generate an OPC corrected layout pattern. The method ultimately produces the corrected layout pattern on a mask blank to create a photo mask.

Another significant patent is "Method of modeling a mask having patterns with arbitrary angles." This patent addresses the processing of a mask layout containing non-Manhattan patterns. It includes identifying edges of these patterns and generating two-dimensional kernels with rotational symmetry. The kernels are applied to obtain a correction field, which is then used to determine an aerial image on a wafer.

Career Highlights

Danping Peng is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at this company has allowed him to apply his innovative ideas in practical settings, contributing to advancements in lithographic technology.

Collaborations

He has collaborated with notable coworkers such as Chien-Jen Lai and Xin Zhou, further enhancing the innovative environment in which he works.

Conclusion

Danping Peng's contributions to optical systems and lithography through his patents demonstrate his expertise and commitment to innovation. His work continues to influence advancements in the semiconductor industry.