This inventor holds 2 USPTO granted patents and 1 EPO patent. Top assignee: New Chromex, Inc.. Active years: 2000-2002.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2000-2002
Title: The Innovations of Danny S Butterfield
Introduction
Danny S Butterfield is an accomplished inventor based in Albuquerque, NM. He has made significant contributions to the field of emissions measurement and analysis. With a total of 2 patents, his work reflects a commitment to advancing technology in his area of expertise.
Latest Patents
Danny's latest patents include an "Apparatus and method for substantially simultaneous measurement of emissions" and an "Apparatus for measuring and applying instrumentation correction to produce a standard Raman spectrum of a sample to be analyzed." The first patent describes a sophisticated apparatus that measures emissions by utilizing an excitation beam and generating daughter beams directed at various substances. This innovative approach allows for the simultaneous collection of spectral measurements, enhancing the accuracy of emissions analysis. The second patent focuses on producing a standard Raman spectrum by applying instrumentation corrections, utilizing incident radiation, and collecting spectral data from both monitor and Raman beams.
Career Highlights
Throughout his career, Danny has worked with notable companies such as New Chromex, Inc. and Bruker Optics, Inc. His experience in these organizations has contributed to his development as a leading inventor in his field.
Collaborations
Danny has collaborated with esteemed colleagues, including Fritz Schreyer Allen and Jun Zhao. Their combined expertise has likely fostered innovative solutions and advancements in their respective projects.
Conclusion
Danny S Butterfield's contributions to emissions measurement and analysis through his patents demonstrate his innovative spirit and dedication to technological advancement. His work continues to influence the field and inspire future innovations.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile