Danny Li

Title: The Innovative Contributions of Danny Li

Introduction

Danny Li is a notable inventor based in Torrance, California. He has made significant contributions to the field of semiconductor technology. With a total of 3 patents to his name, his work has had a considerable impact on the industry.

Latest Patents

One of Danny Li's latest patents is titled "Process for providing clean lift-off of sputtered thin film layers." This unique photoresist process achieves clean and complete lift-off of a thin film layer, such as a sputtered thin film formed on a photoresist above a semiconductor substrate. The process relies on a reentrant photoresist profile that breaks the continuity of the thin film layer, ensuring a clean lift-off. The desired photoresist profile can be obtained through a typical photoresist process preceded by an oxidation process on the semiconductor substrate's surface. This oxidation process provides a thin native oxide layer with a thickness ranging from about 30 to 50 angstroms. Notably, no extra processing steps involving dielectric film deposition and etching are required to achieve clean lift-off, which ensures good visual and electrical yields.

Another significant patent by Danny Li is the "Method of fabricating a self-aligned double recess gate profile." This method involves forming a first mask layer over the substrate, followed by a second mask layer with an opening. An opening at least as wide as the second mask layer's opening is created through the first mask layer to expose the substrate beneath. A first recess is then etched in the semiconductor through the second mask layer's opening. The first mask layer's opening is uniformly expanded, allowing for a wider recess aligned to the first recess. This method is particularly applicable to the formation of self-aligned gate and channel recesses in a GaAs MESFET.

Career Highlights

Danny Li is currently employed at Hughes Aircraft Company, where he continues to innovate in semiconductor technology. His work has been instrumental in advancing the capabilities of semiconductor devices.

Collaborations

Danny has collaborated with notable coworkers, including Tom Y Chi and Liping D Hou, contributing to various projects and innovations in the field.

Conclusion

Danny Li's contributions to semiconductor technology through his innovative patents demonstrate his expertise and commitment to advancing the industry. His work continues to influence the development of new technologies and processes.