Shanghai, China

Danni Yuan

This inventor holds 1 USPTO granted patent and 2 published patent applications and 1 EPO patent. Top assignee: Carrier Corporation. Active years: 2020.

USPTO Granted Patents = 1 

% Patents Active = 100.0

 

Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2020

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1 patent (USPTO):Explore Patents

Title: Danni Yuan: Innovator in Centrifugal Compressor Technology

Introduction

Danni Yuan is a notable inventor based in Shanghai, China. He has made significant contributions to the field of centrifugal compressor technology. His innovative designs aim to enhance the efficiency and functionality of these essential mechanical devices.

Latest Patents

Danni Yuan holds a patent for a "Diffuser for a centrifugal compressor and centrifugal compressor having the same." This invention includes a diffuser that comprises a drive component, a transmission assembly, an adjustment assembly, a spool valve assembly, and a rear wall. The transmission assembly transmits power from the drive component to the adjustment assembly, which can circumferentially reciprocate with respect to the rear wall. This design allows for improved adjustment of the flow passage width, enhancing the overall performance of the compressor.

Career Highlights

Danni Yuan is currently employed at Carrier Corporation, a leading company in the HVAC industry. His work focuses on developing advanced technologies that improve energy efficiency and performance in various applications. His innovative approach has positioned him as a key player in the field of mechanical engineering.

Collaborations

Danni Yuan collaborates with talented professionals such as Vishnu Mohan Sishtla and Kai Deng. Together, they work on projects that push the boundaries of compressor technology and contribute to the advancement of the industry.

Conclusion

Danni Yuan's contributions to centrifugal compressor technology through his innovative patent demonstrate his expertise and commitment to engineering excellence. His work continues to influence the field and inspire future innovations.

Profile summary based on public USPTO records.
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