Dann Morillon

Title: Innovations of Dann Morillon

Introduction

Dann Morillon is a notable inventor based in Peynier, France. He has made significant contributions to the field of semiconductor technology, particularly in the development of MOS transistors. With a total of two patents to his name, Morillon's work has had a considerable impact on the industry.

Latest Patents

Morillon's latest patents include a method of manufacturing a MOS transistor that features substantially parallelepiped-shaped insulating spacers. This innovative method involves forming a conductive first gate and creating insulating spacers along opposite sides of the gate, with the spacers being formed before the gate itself. Another patent focuses on the method of manufacturing MOS transistor spacers, which also emphasizes the formation of the conductive first gate and the insulating spacers.

Career Highlights

Morillon is currently employed at STMicroelectronics (Rousset) SAS, where he continues to push the boundaries of semiconductor technology. His work at this esteemed company has allowed him to collaborate with other talented professionals in the field.

Collaborations

Some of his notable coworkers include Arnaud Regnier and Franck Julien, who share a commitment to advancing technology in the semiconductor industry.

Conclusion

Dann Morillon's contributions to the field of semiconductor technology through his innovative patents and collaborations highlight his importance as an inventor. His work continues to influence the development of MOS transistors and the broader technology landscape.