Danielle Loi

Title: The Innovative Ingenuity of Danielle Loi in Polishing Technologies

Introduction

Danielle Loi, a talented inventor based in San Jose, California, has made significant contributions to the field of chemical mechanical polishing (CMP) systems. With three patents to her name, Danielle's innovative spirit is evident in her latest advancements that enhance the efficiency and effectiveness of polishing platens used in various applications.

Latest Patents

Danielle's recent work includes two noteworthy patents focused on polishing platens and manufacturing methods associated with them. The first patent details methods of manufacturing polishing platens, which involve positioning a polishing platen on a support within a manufacturing system. This system utilizes a cutting tool to shape a cylindrical metal body with a polymer layer, ensuring a polished pad-mounting surface that meets specific flatness or shape requirements.

The second patent introduces a polishing system featuring contactless platen edge control. This innovative design includes a rotatable platen equipped with an annular flange, allowing for vertical deflection to enhance the engagement of the substrate with the polishing pad. An actuator applies pressure to the annular flange, further optimizing the polishing process by enabling precise substrate positioning over the polishing pads.

Career Highlights

Danielle Loi works at Applied Materials, Inc., a leading company in the semiconductor and display technology industries. Her role involves advancing polishing technologies that are essential for achieving high-quality surface finishes in microelectronics manufacturing. Her expertise and innovative practices have positioned her as a crucial asset to her team.

Collaborations

Throughout her career, Danielle has collaborated with talented coworkers, including Steven M. Zuniga and Jay Gurusamy. Their combined efforts have propelled advancements in polishing technologies and contributed to the success of their projects at Applied Materials.

Conclusion

Danielle Loi exemplifies the spirit of innovation in the field of polishing technologies. With her cutting-edge patents and collaborative efforts, she continues to push the boundaries of what is possible in chemical mechanical polishing systems. Her work not only represents her individual contributions but also enhances the overall advancement of technology in her industry.