The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 19, 2022
Filed:
Nov. 20, 2019
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Steven M. Zuniga, Soquel, CA (US);
Jay Gurusamy, Santa Clara, CA (US);
Bum Jick Kim, Irvine, CA (US);
Danielle Loi, San Jose, CA (US);
Assignee:
APPLIED MATERIALS, INC., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B24B 37/30 (2012.01); B24B 37/10 (2012.01); B24B 37/07 (2012.01);
U.S. Cl.
CPC ...
B24B 37/30 (2013.01); B24B 37/07 (2013.01); B24B 37/10 (2013.01); B24B 37/102 (2013.01); B24B 37/105 (2013.01);
Abstract
A polishing system is provided, including a carrier with an offset distance. The offset distance allows a shifted carrier head to cover more surface area of the polishing surface. The offset distance effectively provides an additional rotation of the carrier head about the axis, which allows for a greater area traversed on the polishing surface, improving chemical mechanical polishing uniformity on the substrate.