Daniel V Whitlock

Title: The Innovative Contributions of Daniel V Whitlock

Introduction

Daniel V Whitlock is a notable inventor based in Healdsburg, California. He has made significant contributions to the field of vacuum coating deposition technology. His innovative approach has led to the development of a unique apparatus that enhances the efficiency and effectiveness of coating processes.

Latest Patents

Whitlock holds a patent for an "Apparatus and method for vacuum coating deposition." This invention employs a vacuum chamber with a superstructure that supports deposition components, such as sputter targets and substrates. The design ensures a fixed relative position between these components, minimizing the impact of environmental and operational vibrations. The superstructure can be housed within the chamber or extend externally, providing flexibility in design. Additionally, the apparatus includes a sensor, such as an optical monitor, that continuously measures film thickness during deposition, allowing for real-time adjustments to the coating process.

Career Highlights

Throughout his career, Whitlock has demonstrated a commitment to advancing technology in the field of vacuum coating. His work at Cierra Photonics Inc. has positioned him as a key player in the development of innovative solutions for coating applications. His patent reflects his expertise and dedication to improving manufacturing processes.

Collaborations

Whitlock has collaborated with talented individuals such as Michael A Scobey and David L Soberanis. These partnerships have contributed to the successful development and implementation of advanced coating technologies.

Conclusion

Daniel V Whitlock's contributions to vacuum coating deposition technology exemplify his innovative spirit and dedication to advancing the field. His patent and collaborative efforts highlight the importance of teamwork in achieving technological advancements.