Company Filing History:
Years Active: 2010
Title: **Daniel Tanzil: Innovator in Extreme Ultraviolet Lithography**
Introduction
Daniel Tanzil is a notable inventor based in Santa Clara, California, recognized for his contributions to the field of photolithography. With a focus on innovations that enhance manufacturing processes in the semiconductor industry, he has secured one patent that exemplifies his expertise.
Latest Patents
Tanzil's most recent patent revolves around a pellicle designed for extreme ultraviolet lithography. His invention introduces methods of fabrication and utilization of the pellicle, which are critical for maintaining the integrity of photomasks during lithography processes. The patent details a pellicle that may include a wire mesh configured in either a square or hexagonal pattern. Furthermore, it describes the application of a thin film of a material with a high Young's modulus coated on the wire mesh's surface. The innovative method of fabrication involves forming a sacrificial layer on the wire mesh, followed by thin film application, and concludes with the sacrificial layer's removal to create the pellicle. This inventive approach aims to safeguard photomasks from particulate accumulation during extreme ultraviolet lithography, thus enhancing the efficiency of the process.
Career Highlights
Daniel Tanzil is affiliated with Intel Corporation, a leading technology company renowned for its advancements in semiconductor manufacturing. Working at Intel, he has positioned himself as an integral part of a team dedicated to pushing the boundaries of technology through innovative solutions.
Collaborations
Throughout his career, Tanzil has collaborated with esteemed colleagues such as Michael Scott Goldstein and Yashesh Shroff. These partnerships highlight his ability to work alongside other brilliant minds in the industry, fostering an environment of creativity and innovation.
Conclusion
In summary, Daniel Tanzil stands out as an inventive force in the field of extreme ultraviolet lithography. His patented pellicle represents not only a significant advancement in lithography technology but also showcases the importance of collaborative innovation in driving industry progress. As he continues his work at Intel Corporation, the implications of his contributions are sure to resonate throughout the semiconductor landscape.