Canton, MI, United States of America

Daniel R Buckley

This inventor holds 2 USPTO granted patents and 2 EPO patents. Top assignee: Laser Mechanisms, Inc.. Active years: 2013-2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Daniel R Buckley. Retrieved from https://idiyas.com/inventor/daniel-r-buckley

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

 

Average Co-Inventor Count = 3.4

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2013-2016

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2 patents (USPTO):Explore Patents

Title: Daniel R. Buckley: Capacitive Gauging System Inventor

Introduction

Daniel R. Buckley is an inventor based in Canton, Michigan, whose patent work includes a fast-response capacitive gauging system. He is associated with Laser Mechanisms, Inc. His listed portfolio includes 2 patents.

Latest Patents

Buckley’s listed patent, “Fast Response Capacitive Gauging System Featuring Steep Slope Filter Discrimination Circuit,” describes a high-speed, high-accuracy system designed to detect very small changes in capacitance, even amid electrical noise. An oscillator feeds a steep-slope filter, which helps distinguish those changes. When the probe tip is retracted, the system calibrates the oscillator frequency to the center of the filter’s linear operating region. This calibration helps compensate for temperature and humidity variations in manufacturing environments.

Career Highlights

Buckley’s patent work focuses on precision measurement technology. The capacitive gauging system’s combination of noise discrimination and environmental calibration is intended to support reliable measurements in manufacturing settings.

Collaborations

Buckley’s listed coworkers include Gerald Francis Hermann and Keith Jefferies. His company affiliation is Laser Mechanisms, Inc.

Conclusion

Daniel R. Buckley’s patent portfolio reflects work on capacitive gauging technology designed to deliver fast, accurate measurements under changing manufacturing conditions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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