Company Filing History:
Years Active: 2003-2007
Title: The Innovative Contributions of Daniel N Hopkins
Introduction
Daniel N Hopkins is a notable inventor based in Fort Worth, TX, who has made significant contributions to the field of plasma plating. With a total of six patents to his name, his work has advanced the technology used in various applications, showcasing his expertise and innovative spirit.
Latest Patents
Among his latest patents, one notable invention is the "System and method for plasma plating." This exemplary system provides a method for generating a deposition layer on a substrate. The process involves positioning a substrate within a vacuum chamber, reducing the pressure to a level at or below 4 milliTorr, and introducing a gas to raise the pressure to between 0.1 milliTorr and 4 milliTorr. The method also includes applying a dc signal to the substrate and heating the depositant to generate a plasma in the vacuum chamber. Another significant patent is the "Mobile plating system and method," which describes a method for using a mobile plating system that includes positioning an external vacuum pump and coupling it to a vacuum chamber to reduce mechanical vibrations during operation.
Career Highlights
Throughout his career, Daniel has worked with companies such as Basic Resources, Inc. and Basic Research, Inc. His experience in these organizations has allowed him to refine his skills and contribute to innovative projects that push the boundaries of technology.
Collaborations
Daniel has collaborated with notable individuals in