The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 31, 2007

Filed:

Oct. 26, 1999
Applicants:

Jerry D. Kidd, Granbury, TX (US);

Craig D. Harrington, Cleburne, TX (US);

Daniel N. Hopkins, Fort Worth, TX (US);

Inventors:

Jerry D. Kidd, Granbury, TX (US);

Craig D. Harrington, Cleburne, TX (US);

Daniel N. Hopkins, Fort Worth, TX (US);

Assignee:

Basic Resources, Inc., Dallas, TX (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/14 (2006.01); C23C 14/16 (2006.01); C23C 14/24 (2006.01); C23C 14/50 (2006.01); C23C 14/04 (2006.01); H05H 1/46 (2006.01); H05H 1/26 (2006.01);
U.S. Cl.
CPC ...
Abstract

An exemplary system and method for plasma plating are provided to generate a deposition layer on a substrate. The method for plasma plating includes positioning a substrate within a vacuum chamber, positioning a depositant in a filament within the vacuum chamber, reducing the pressure in the vacuum chamber to a level at or below 4 milliTorr, and introducing a gas into the vacuum chamber at a rate to raise the pressure in the vacuum chamber to a level at or between 0.1 milliTorr and 4 milliTorr. In other embodiments, the gas is not required to be introduced. The method also includes applying a dc signal to the substrate at a voltage amplitude at or between 1 volt and 5000 volts, applying a radio frequency signal to the substrate at a power level at or between 1 watt and 50 watts, and heating the depositant to a temperature at or above the melting point of the depositant to generate a plasma in the vacuum chamber. The plasma will preferably include both positively charged gas and depositant ions that will be attracted to the substrate, which will be provided at a negative potential if the dc signal is provided at a negative polarity.


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