Company Filing History:
Years Active: 2003-2007
Title: Craig D. Harrington: Innovator in Plasma Plating Technology
Introduction
Craig D. Harrington is a notable inventor based in Cleburne, Texas, with a focus on advanced plasma plating technologies. He holds a total of six patents, showcasing his contributions to the field of materials science and engineering. His innovative approaches have paved the way for new methods in the deposition of materials.
Latest Patents
Harrington's latest patents include a "System and method for plasma plating," which outlines a process for generating a deposition layer on a substrate. This method involves positioning a substrate within a vacuum chamber, reducing the pressure to a level at or below 4 milliTorr, and introducing a gas to raise the pressure to between 0.1 milliTorr and 4 milliTorr. The process also includes applying a dc signal to the substrate and generating a plasma in the vacuum chamber. Another significant patent is the "Mobile plating system and method," which describes a mobile plating system that can be positioned at a desired location for plating, utilizing an external vacuum pump to maintain optimal conditions within the vacuum chamber.
Career Highlights
Throughout his career, Harrington has worked with companies such as Basic Resources, Inc. and Basic Research, Inc. His experience in these organizations has contributed to his expertise in plasma technology and materials deposition.
Collaborations
Harrington has collaborated with notable individuals in his field, including Jerry D. Kidd and Daniel N. Hopkins. These partnerships have likely enhanced his innovative capabilities and broadened the impact of his work.
Conclusion
Craig D. Harrington is a distinguished inventor whose work in plasma plating technology has made significant contributions to the field. His patents reflect a commitment to advancing materials science and engineering, and his collaborations further highlight the importance of teamwork in innovation.