This inventor holds 2 USPTO granted patents. Top assignee: Advanced Technology Materials, Inc.. Active years: 2001.
Location History:
- Fremont, CA (US) (2001)
- Peabody, MA (US) (2001)
Company Filing History:
Years Active: 2001
Title: Innovations by Daniel N Fine
Introduction
Daniel N Fine is an accomplished inventor based in Fremont, CA. He has made significant contributions to the field of semiconductor fabrication, holding a total of 2 patents. His work focuses on developing advanced cleaning formulations that enhance the efficiency of semiconductor manufacturing processes.
Latest Patents
Daniel's latest patents include a formulation for post plasma ashing wafer cleaning. This innovative solution utilizes aqueous ammonium fluoride and amine-containing compositions to effectively clean inorganic residues on semiconductor substrates. The semiconductor wafer cleaning formulation is designed for use in post plasma ashing processes, comprising specific components in defined percentage by weight ranges.
Career Highlights
Daniel Fine is currently employed at Advanced Technology Materials, Inc. His expertise in semiconductor cleaning technologies has positioned him as a key player in the industry. His contributions have not only advanced the technology but have also improved the overall efficiency of semiconductor fabrication.
Collaborations
Throughout his career, Daniel has collaborated with notable professionals in the field, including William A Wojtczak and George Guan. These collaborations have fostered innovation and have led to the development of cutting-edge technologies in semiconductor cleaning.
Conclusion
Daniel N Fine's work exemplifies the spirit of innovation in the semiconductor industry. His patents and collaborations reflect his commitment to advancing technology and improving manufacturing processes.