Daniel Moonen

Title: The Innovations of Daniel Moonen

Introduction

Daniel Moonen is a notable inventor based in Delft, Netherlands. He has made significant contributions to the field of electron beam lithography, holding 2 patents that showcase his innovative approach to controlling beam emittance.

Latest Patents

One of his latest patents is titled "Lens array for electron beam lithography tool." This invention involves a method and apparatus for controlling beam emittance by placing a lens array in a drift space of an illumination system component. The illumination system component may be an electron gun or a liner tube or drift tube, attachable to an electron gun. The lens array can consist of one or more mesh grids or a combination of grids and continuous foils. This lens array forms a multitude of microlenses resembling an optical 'fly's eye' lens. It splits an incoming solid electron beam into multiple subbeams, ensuring that the outgoing beam emittance differs from the incoming beam emittance, while the total beam current remains unchanged. This method allows for independent control of beam current and beam emittance, which is particularly beneficial in a SCALPEL illumination system.

Another significant patent by Moonen is "Illumination system for electron beam lithography tool." Similar to his previous invention, this method and apparatus also focus on controlling beam emittance by utilizing a quadrupole lens array in a drift space of an illumination system component. The quadrupole lens array may consist of three or more mesh grids or a combination of grids and continuous foils. This design also forms a multitude of microlenses resembling an optical 'fly's eye' lens, splitting the incoming solid electron beam into multiple subbeams while maintaining the total beam current.

Career Highlights

Throughout his career, Daniel Moonen has worked with various companies, including Agere Systems Inc. His work has significantly impacted the field of electron beam lithography, enhancing the capabilities of illumination systems.

Collaborations

Some of his notable coworkers include Pieter Kruit and Victor Katsap, who have contributed to his innovative projects.

Conclusion

Daniel Moonen's contributions to electron beam lithography through his patents demonstrate his expertise and innovative spirit in the field. His work continues to influence advancements in illumination systems, showcasing the importance of his inventions.