Stein am Rhein, Switzerland

Daniel Müller

This inventor holds 1 USPTO granted patent. Top assignee: Hera Rotterdam, B.v.. Active years: 2002.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Daniel Müller. Retrieved from https://idiyas.com/inventor/daniel-manduumlller

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 1.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2002

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1 patent (USPTO):Explore Patents

Title: The Innovations of Daniel Müller

Introduction

Daniel Müller is an accomplished inventor based in Stein am Rhein, Switzerland. He has made significant contributions to the field of opto-electronic technology. His innovative work focuses on distance measurement and object identification, showcasing his expertise in this specialized area.

Latest Patents

Daniel Müller holds a patent for an opto-electronic distance sensor and method for opto-electronic distance measurement. This sensor utilizes triangulation measurement to determine the distance to an object within a monitoring zone. A light source emits light onto the object, and the scattered light is captured by a receiving element. The design includes tappings distributed over its length to adjust the measuring range and enhance resolution. The sensor is characterized by low measuring inaccuracy and continuous adjustability of the measuring distance.

Career Highlights

Daniel Müller is currently associated with Hera Rotterdam B.V., where he applies his expertise in developing advanced sensor technologies. His work has been instrumental in improving measurement accuracy and efficiency in various applications.

Collaborations

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Conclusion

Daniel Müller exemplifies innovation in the field of opto-electronic distance measurement. His contributions continue to influence advancements in sensor technology, making him a notable figure in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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