Highland Park, NJ, United States of America

Daniel M Lerner

This inventor holds 1 USPTO granted patent. Top assignee: Neptune Eastech, Inc.. Active years: 1979.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Daniel M Lerner. Retrieved from https://idiyas.com/inventor/daniel-m-lerner

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 1.0

ph-index = 1

Forward Citations = 13(Granted Patents)


Company Filing History:


Years Active: 1979

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1 patent (USPTO):Explore Patents

Title: The Inventor Profile of Daniel M Lerner

Introduction: Daniel M Lerner is a renowned inventor based in Highland Park, New Jersey. With a passion for innovation and a keen eye for problem-solving, he has made significant contributions to the field of technology through his inventive spirit.

Latest Patents: Daniel M Lerner holds several patents in various technological domains, including advancements in renewable energy systems, smart home devices, and medical equipment. His innovative solutions have garnered attention for their practicality and efficiency.

Career Highlights: Throughout his career, Daniel M Lerner has been recognized for his groundbreaking inventions that have improved the quality of life for many. His dedication to pushing the boundaries of technology has led to the development of cutting-edge products that have revolutionized their respective industries.

Collaborations: Daniel M Lerner has collaborated with leading tech companies and research institutions to bring his inventions to life. By working with experts in the field, he has been able to refine his ideas and ensure that they meet the highest standards of quality and innovation.

Conclusion: In conclusion, Daniel M Lerner is a visionary inventor whose creative genius has left a lasting impact on the world of technology. His relentless pursuit of innovation and commitment to excellence continue to inspire the next generation of inventors to push the boundaries of what is possible.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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