Company Filing History:
Years Active: 2019
Title: The Innovative Contributions of Daniel Leypold
Introduction
Daniel Leypold is a notable inventor based in Freiburg, Germany. He has made significant contributions to the field of plasma technology, particularly in monitoring discharges during plasma processes. His work is characterized by a focus on reliability and efficiency, which is crucial in various industrial applications.
Latest Patents
Leypold holds a patent for a method and device for monitoring a discharge in a plasma process. This innovative patent involves detecting signal paths of plasma supply signals within specific time ranges. The method generates an identification signal if deviations occur between the detected signal paths, enabling the identification of arcs in a rapid and reliable manner. This advancement is essential for improving the safety and effectiveness of plasma processes.
Career Highlights
Daniel Leypold is currently employed at Trumpf Huettinger GmbH + Co. KG, where he continues to develop and refine technologies related to plasma processes. His expertise in this area has positioned him as a valuable asset to his company and the industry at large.
Collaborations
Leypold has collaborated with talented colleagues such as Ulrich Richter and Fabian Wunn. These partnerships have fostered an environment of innovation and creativity, leading to advancements in their respective fields.
Conclusion
Daniel Leypold's contributions to plasma technology through his patent and work at Trumpf Huettinger GmbH + Co. KG highlight his role as an influential inventor. His innovative methods for monitoring plasma discharges are paving the way for safer and more efficient industrial processes.