The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 15, 2019
Filed:
Apr. 01, 2016
Trumpf Huettinger Gmbh + Co. KG, Freiburg, DE;
TRUMPF Huettinger GmbH + Co. KG, Freiburg, DE;
Abstract
Devices and methods for monitoring a discharge in a plasma process are provided. An example method includes detecting at least a first signal path of at least one plasma supply signal within at least a first time range within at least one period of the plasma supply signal, detecting at least a second signal path of the at least one plasma supply signal within at least a second time range which is at the point corresponding to the first time range in at least one other period of the plasma supply signal, and generating an identification signal if the second signal path deviates by at least a distance from the first signal path. The distance has a minimum time difference and a minimum signal amplitude difference. The method enables to identify arcs in a very reliable and very rapid manner.