Pointe-Claire, Canada

Daniel Laroche

This inventor holds 1 USPTO granted patent. Top assignee: Noranda Inc.. Active years: 1999.


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 13(Granted Patents)


Company Filing History:


Years Active: 1999

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Daniel Laroche

Introduction

Daniel Laroche is a notable inventor based in Pointe-Claire, Canada. He has made significant contributions to the field of materials science, particularly in the filtration of molten materials. His work focuses on improving the quality of magnesium chloride electrolyte by removing impurities.

Latest Patents

Laroche holds a patent for a method and apparatus for the removal of solid particles from magnesium chloride. This invention addresses the filtration of molten materials, specifically targeting the removal of MgO impurities present in molten magnesium chloride electrolyte. The system he developed ensures that the concentration of solid remaining in the molten material is less than 0.05 wt %. This innovation is particularly beneficial for industries that utilize magnesium and aluminum in their processes.

Career Highlights

Daniel Laroche is associated with Noranda Inc., a company known for its advancements in metallurgy and materials processing. His work at Noranda has allowed him to apply his innovative ideas in a practical setting, contributing to the company's reputation for excellence in the field.

Collaborations

Throughout his career, Laroche has collaborated with talented individuals such as Pasquale Ficara and Cesur Celik. These partnerships have fostered a creative environment that encourages the development of groundbreaking technologies.

Conclusion

Daniel Laroche's contributions to the field of materials science, particularly through his patented methods for filtering molten materials, highlight his innovative spirit and dedication to improving industrial processes. His work continues to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
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