Daniel L Birx Late Of

Title: The Innovative Contributions of Daniel L. Birx

Introduction

Daniel L. Birx, a notable inventor based in Potomac, MD, has made significant strides in the field of high-energy photon sources. With a focus on advancing technology, he holds a patent that showcases his expertise and innovative spirit.

Latest Patents

Birx's most recent patent is titled "Plasma focus light source with active and buffer gas control." This invention describes a high-energy photon source that utilizes a pair of plasma pinch electrodes located in a vacuum chamber. The chamber is filled with a working gas that includes a noble buffer gas and an active gas, which is selected to provide a desired spectral line. The invention features a pulse power source that delivers electrical pulses at repetition rates of 1000 Hz or greater, generating high-temperature, high-density plasma pinches in the working gas. This technology is capable of producing radiation at the spectral line of the active gas, with a fourth-generation unit described that produces 20 mJ pulses at 13.5 nm into 2π steradians at repetition rates of 2000 Hz using xenon as the active gas.

Career Highlights

Birx has been associated with Cymer, Inc., where he has contributed to the development of advanced photon sources. His work has been instrumental in pushing the boundaries of what is possible in high-energy applications.

Collaborations

Throughout his career, Birx has collaborated with notable colleagues, including Stephan T. Melnychuk and William N. Partlo. These partnerships have fostered innovation and have led to advancements in their respective fields.

Conclusion

Daniel L. Birx's contributions to the field of high-energy photon sources exemplify his innovative spirit and dedication to advancing technology. His patent reflects a significant achievement in the realm of plasma technology, showcasing the potential for future developments in this area.