Daniel Köhler

Title: The Innovative Contributions of Daniel Köhler

Introduction

Daniel Köhler is a notable inventor based in Dresden, Germany. He has made significant contributions to the field of semiconductor technology, particularly in the fabrication of trench capacitors. His innovative approach has led to the development of a unique method that enhances efficiency and reduces costs in semiconductor manufacturing.

Latest Patents

Köhler holds a patent for a "Method of etching a layer in a trench and method of fabricating a trench capacitor." This patent describes a process where a trench is formed in a substrate, which includes an upper and lower region. In this method, nanocrystallites and/or a seed layer for nanocrystallites are deposited in both regions. The innovative aspect of this process is that the etching parameters are carefully selected to remove the nanocrystallites and/or seed layer only from the upper region of the trench. This approach eliminates the need for an expensive mask layer in the lower region, thereby streamlining the fabrication process.

Career Highlights

Köhler is associated with Infineon Technologies AG, a leading company in semiconductor solutions. His work at Infineon has allowed him to contribute to cutting-edge technologies that are essential for modern electronic devices. With a focus on innovation, Köhler continues to push the boundaries of what is possible in semiconductor manufacturing.

Collaborations

Some of his notable coworkers include Jörn Lützen and Barbara Schmidt. Their collaborative efforts have further advanced the research and development initiatives at Infineon Technologies AG.

Conclusion

Daniel Köhler's contributions to the field of semiconductor technology exemplify the spirit of innovation. His patented methods not only enhance manufacturing efficiency but also pave the way for future advancements in the industry.