Newark, DE, United States of America

Daniel K Cha

This inventor holds 2 USPTO granted patents. Top assignee: US Government as Represented by the Secretary of the Army. Active years: 2008-2009.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Daniel K Cha. Retrieved from https://idiyas.com/inventor/daniel-k-cha

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 4.0

ph-index = 2

Forward Citations = 10(Granted Patents)


Company Filing History:


Years Active: 2008-2009

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2 patents (USPTO):Explore Patents

Title: Daniel K Cha: Innovator in Hazardous Waste Treatment

Introduction

Daniel K Cha is an accomplished inventor based in Newark, DE (US). He has made significant contributions to the field of hazardous waste treatment, particularly in the production of energetics such as explosives. With a total of 2 patents to his name, Cha's work focuses on innovative systems designed to effectively manage and neutralize hazardous waste.

Latest Patents

Cha's latest patents include a "System for destroying hazardous waste resultant from the production of energetics" and a "Process for treating waste from the production of energetics." The first patent describes a waste stream treatment method that utilizes a pre-filter with media, preferably sand, and a reducing metal, such as elemental iron (Fe). This system connects to a zero-valent metal column reactor, where the waste stream undergoes a reducing process. The resultant product is then processed through a continuously stirred tank reactor (CSTR) for Fenton oxidation, followed by sedimentation and pH-neutralization. The second patent outlines a similar approach, emphasizing the integration of the pre-filter and reactor as a single unit to optimize waste treatment.

Career Highlights

Daniel K Cha works for the US Government as represented by the Secretary of the Army. His role involves developing innovative solutions for waste management in the energetics sector. Cha's expertise in this area has led to advancements that enhance safety and environmental protection.

Collaborations

Cha collaborates with notable colleagues, including Seok-Young Oh and Pei Chiu. Their combined efforts contribute to the development of effective waste treatment technologies.

Conclusion

Daniel K Cha's innovative work in hazardous waste treatment showcases his commitment to environmental safety and efficiency. His patents reflect a deep understanding of the complexities involved in managing waste from energetics production. Through his career, Cha continues to make a significant impact in his field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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