Daniel J Koch

Title: The Innovations of Daniel J Koch

Introduction

Daniel J Koch is a notable inventor based in Rochester, MN (US). He has made significant contributions to the field of technology, particularly in the development of silicon-on-sapphire wafers. With a total of 2 patents to his name, Koch's work has implications for various applications in the semiconductor industry.

Latest Patents

Koch's latest patents include a groundbreaking invention titled "Silicon-on-insulator wafer having conductive layer for detection with electrical sensors." This patent describes a method for fabricating a silicon-on-sapphire wafer that can be processed by silicon-wafer-processing equipment. The innovation involves depositing a layer on the backside of the silicon-on-sapphire wafer, which possesses optical and electrical properties of silicon. This allows the wafer to be detected by sensors designed to sense the presence of a silicon wafer. Another significant patent is "Method for fabricating a silicon-on-sapphire wafer," which outlines a similar process for enhancing the functionality of silicon-on-sapphire wafers.

Career Highlights

Koch is currently employed at International Business Machines Corporation (IBM), where he continues to push the boundaries of technology. His work at IBM has allowed him to collaborate with some of the brightest minds in the industry, contributing to advancements in semiconductor technology.

Collaborations

Some of Koch's notable coworkers include James L Egley and George M Gut. Their collaborative efforts have further enriched the innovative environment at IBM, fostering the development of cutting-edge technologies.

Conclusion

Daniel J Koch's contributions to the field of technology, particularly through his patents and work at IBM, highlight his role as a significant inventor. His innovations in silicon-on-sapphire wafers are paving the way for advancements in the semiconductor industry.