Daniel J Hellebusch

Title: The Innovations of Daniel J Hellebusch

Introduction

Daniel J Hellebusch is an accomplished inventor based in Berkeley, CA. He has made significant contributions to the field of nanoimprint lithography, particularly through his innovative patent related to fluorinated silazane release agents. His work has implications for the advancement of imprint lithography technologies.

Latest Patents

Hellebusch holds a patent for "Fluorinated silazane release agents in nanoimprint lithography." This patent describes an imprint lithography release agent with a general formula where R represents H or CH, n is an integer from 1 to 5, and m is an integer from 1 to 40. The fluorinated silazanes of this formula can be utilized to form a release layer on an imprint lithography template, added to an imprint lithography resist, or both. He has 1 patent to his name.

Career Highlights

Hellebusch is affiliated with the University of Texas System, where he continues to engage in research and development in the field of nanoimprint lithography. His work is characterized by a commitment to innovation and the advancement of technology in this specialized area.

Collaborations

Throughout his career, Hellebusch has collaborated with notable colleagues, including Carlton Grant Willson and Tsuyoshi Ogawa. These collaborations have contributed to the development of new technologies and methodologies in the field.

Conclusion

Daniel J Hellebusch is a prominent figure in the realm of nanoimprint lithography, with a focus on innovative release agents that enhance the efficiency of imprint lithography processes. His contributions continue to shape the future of this technology.