The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 06, 2015

Filed:

Feb. 24, 2012
Applicants:

Carlton Grant Willson, Austin, TX (US);

Tsuyoshi Ogawa, Kawagoe, JP;

Michael W. Lin, Houston, TX (US);

Daniel J. Hellebusch, Berkeley, CA (US);

B. Michael Jacobsson, Fort Worth, TX (US);

William K. Bell, Austin, TX (US);

Inventors:

Carlton Grant Willson, Austin, TX (US);

Tsuyoshi Ogawa, Kawagoe, JP;

Michael W. Lin, Houston, TX (US);

Daniel J. Hellebusch, Berkeley, CA (US);

B. Michael Jacobsson, Fort Worth, TX (US);

William K. Bell, Austin, TX (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/00 (2006.01); B82Y 10/00 (2011.01); B82Y 40/00 (2011.01); B29C 35/08 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0002 (2013.01); B82Y 10/00 (2013.01); B82Y 40/00 (2013.01);
Abstract

An imprint lithography release agent having general formula (1): where Rrepresents H or CH, n is an integer from 1 to 5, and m is an integer from 1 to 40. Fluorinated silazanes of general formula (1) can be used to form a release layer on an imprint lithography template, added to an imprint lithography resist, or both.


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