Company Filing History:
2 out of 766 
1 out of 34 
Years Active: 2004-2021
Title: The Innovative Contributions of Daniel J C Herr
Introduction
Daniel J C Herr is a notable inventor based in Chapel Hill, NC (US). He has made significant contributions to the field of nanotechnology, holding a total of 3 patents. His work focuses on advanced device applications and innovative methods for patterning materials.
Latest Patents
One of Herr's latest patents involves the development of amphiphilic hybrid nanomaterials. The devices and methods described in this patent push forward the resolution limits of directed self-assembly (DSA) technology. Specifically, the patent details compositions of bioinspired DSA materials and methods that enable the formation of sub-7 nm line-space patterns. This technology aims to achieve functional nanoscopic structures, such as conducting nanowires on a substrate.
Another significant patent by Herr pertains to patterning methods and systems using reflected interference patterns. This method includes projecting coherent radiation toward a reflector surface, allowing the coherent radiation to be reflected off the surface. The result is a holographic projection of a desired image, which can be projected onto a layer on a substrate. This innovative approach opens new avenues for precise material patterning.
Career Highlights
Throughout his career, Daniel J C Herr has worked with esteemed institutions such as the University of Tennessee Research Foundation and the University of North Carolina at Greensboro. His experience in these organizations has contributed to his expertise in nanotechnology and materials science.
Collaborations
Herr has collaborated with notable individuals in his field, including David Charles Joy and Hemali Rathnayake. These collaborations have further enriched his research and development efforts.
Conclusion
Daniel J C Herr's innovative work in nanotechnology and his contributions through his patents highlight his role as a significant inventor in the field. His advancements in directed self-assembly technology and patterning methods continue to influence the development of advanced materials and devices.