Daniel Hernandez Castillo

Title: The Innovative Contributions of Daniel Hernandez Castillo

Introduction

Daniel Hernandez Castillo is a notable inventor based in Laveen, Arkansas. He has made significant contributions to the field of chemical engineering, particularly in the development of advanced materials for chemical mechanical polishing (CMP) formulations. His innovative work has led to the creation of a unique patent that enhances CMP processes.

Latest Patents

Daniel holds a patent for a "Free radical-forming activator attached to solid and used to enhance CMP formulations." This patent describes a CMP composition that includes a fluid comprising water and at least one oxidizing compound that produces free radicals when contacted with an activator. The composition also features a plurality of particles with surfaces that include activators selected from ions or compounds of Cu, Fe, Mn, Ti, or mixtures thereof. The patent highlights the surprising effectiveness of using as little as 0.2 ppm and 12 ppm of activator when the particles are suspended in the fluid as a slurry.

Career Highlights

Daniel is currently employed at DuPont Air Products Nanomaterials, LLC, where he continues to innovate and develop new materials for various applications. His work has been instrumental in advancing CMP technologies, which are crucial in the semiconductor manufacturing process.

Collaborations

Throughout his career, Daniel has collaborated with talented individuals such as Junaid Ahmed Siddiqui and Robert J Small. These collaborations have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.

Conclusion

Daniel Hernandez Castillo's contributions to the field of chemical engineering and his innovative patent demonstrate his commitment to advancing technology in CMP formulations. His work continues to impact the industry positively, showcasing the importance of innovation in material science.