Potsdam, Germany

Daniel Haake

This inventor holds 2 USPTO granted patents and 1 EPO patent. Top assignee: Evonik Operations Gmbh. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Daniel Haake. Retrieved from https://idiyas.com/inventor/daniel-haake

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

 

Average Co-Inventor Count = 9.0

ph-index = 1


Company Filing History:


Years Active: 2025

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2 patents (USPTO):Explore Patents

Title: The Innovations of Daniel Haake

Introduction

Daniel Haake is an accomplished inventor based in Potsdam, Germany. He has made significant contributions to the field of coating surface characterization. His innovative approach has led to the development of a unique method that enhances the understanding of coating surfaces.

Latest Patents

Daniel Haake holds a patent for a method titled "Qualitative or quantitative characterization of a coating surface." This patent provides a comprehensive approach for the qualitative and/or quantitative characterization of coating surfaces, showcasing his expertise in this specialized area.

Career Highlights

Daniel is currently employed at Evonik Operations GmbH, a leading company in specialty chemicals. His work at Evonik has allowed him to apply his innovative ideas in a practical setting, contributing to advancements in coating technologies.

Collaborations

Throughout his career, Daniel has collaborated with notable colleagues, including Philipp Isken and Sandra Bittorf. These collaborations have fostered a creative environment that encourages the exchange of ideas and enhances the development of new technologies.

Conclusion

Daniel Haake's contributions to the field of coating surface characterization exemplify the impact of innovation in technology. His patent and work at Evonik Operations GmbH highlight his role as a key figure in advancing this important area of research.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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