This inventor holds 2 USPTO granted patents. Top assignee: E.i. Dupont De Nemours and Company. Active years: 1998-1999.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1998-1999
Title: The Innovations of Daniel Francis Sheehan, Jr.
Introduction
Daniel Francis Sheehan, Jr. is a notable inventor based in Cliffwood Beach, NJ (US). He has made significant contributions to the field of photopolymer technology, particularly in the development of cylindrical photosensitive elements. With a total of two patents to his name, Sheehan's work has had a considerable impact on the printing industry.
Latest Patents
Sheehan's latest patents focus on methods and apparatus for forming seamless cylindrical photosensitive elements of uniform thickness on flexible sleeves. The invention involves an apparatus that includes a mandrel, a mandrel support assembly, a calendering assembly, a drive system, and at least one heating element. The methods described in the patents detail the process of forming these elements from a stream of molten photopolymerizable material or a solid or molten sheet of photopolymerizable material. These seamless cylindrical photosensitive elements are specifically designed for use on polyester sleeves in printing cylinders.
Career Highlights
Daniel Francis Sheehan, Jr. is currently employed at E.I. du Pont de Nemours and Company, where he continues to innovate and develop new technologies. His work has been instrumental in advancing the capabilities of photopolymer materials in various applications.
Collaborations
Throughout his career, Sheehan has collaborated with talented individuals such as Stephen Cushner and Roxy Ni Fan. These collaborations have contributed to the successful development of his patented technologies.
Conclusion
Daniel Francis Sheehan, Jr. is a distinguished inventor whose work in photopolymer technology has led to significant advancements in the printing industry. His innovative patents and collaborations highlight his commitment to excellence in his field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
