Besançon, France

Daniel Foltete

This inventor holds 1 USPTO granted patent. Top assignee: Lvmh Recherche. Active years: 1999.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Daniel Foltete. Retrieved from https://idiyas.com/inventor/daniel-foltete

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 1999

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1 patent (USPTO):Explore Patents

Title: The Innovations of Daniel Foltete

Introduction

Daniel Foltete is an accomplished inventor based in Besançon, France. He is known for his innovative contributions to the field of applicator devices. With a focus on practical solutions, Foltete has made significant strides in enhancing the functionality of various tools.

Latest Patents

Foltete holds a patent for an applicator device with a self-tapping piston. This invention showcases his ability to combine engineering principles with user-friendly design. The patent reflects his commitment to improving the efficiency and effectiveness of applicator devices.

Career Highlights

Currently, Daniel Foltete works at LVMH Recherche, a leading research and development company. His role allows him to explore new ideas and technologies that can benefit the luxury goods industry. Foltete's work is characterized by a dedication to innovation and quality.

Collaborations

Throughout his career, Foltete has collaborated with notable colleagues, including Francois N Lhuisset and Gerard Normand. These partnerships have fostered a creative environment that encourages the exchange of ideas and expertise.

Conclusion

Daniel Foltete's contributions to the field of invention, particularly in applicator devices, highlight his innovative spirit and dedication to improving technology. His work at LVMH Recherche and his collaborations with esteemed colleagues further emphasize his impact on the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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