Company Filing History:
Years Active: 2000-2002
Title: Innovations by Daniel F. Kennedy
Introduction
Daniel F. Kennedy is an accomplished inventor based in San Jose, California. He holds three patents that showcase his expertise in the field of chemical mechanical polishing systems. His innovative contributions have significantly impacted the industry.
Latest Patents
Kennedy's latest patents include a method and apparatus for automatically changing a polishing pad in a chemical mechanical polishing system. This invention describes a controller that places a mechanical device against a used polishing pad while it is on the polishing platen. The controller activates a pad chucking mechanism to affix the used pad to the mechanical device. It then moves the mechanical device and the pad toward a used pad receptacle, where the pad chucking mechanism is deactivated to release the used pad. Following this, the controller places the mechanical device against a clean polishing pad in a clean pad dispenser and reactivates the pad chucking mechanism to affix the clean pad. The mechanical device and the clean pad are then moved toward the platen, where the clean polishing pad is released onto the platen.
Another notable patent is the combined slurry dispenser and rinse arm. This invention provides a method and apparatus for delivering rinse agents to a surface, such as a polishing pad surface. It also includes a method of cleaning surfaces by delivering a spray of rinse agents, causing the rinse agent to flow across the surface to collect unwanted debris.
Career Highlights
Kennedy has made significant strides in his career at Applied Materials, Inc. His work has been instrumental in advancing technologies related to chemical mechanical polishing systems. His innovative spirit and technical expertise have earned him recognition in the field.
Collaborations
Throughout his career, Kennedy has collaborated with notable colleagues, including Victor Belitsky and Boris Fuksshimov. These collaborations have fostered a creative environment that has led to groundbreaking innovations.
Conclusion
Daniel F. Kennedy's contributions to the field of chemical mechanical polishing systems through his patents demonstrate his commitment to innovation and excellence. His work continues to influence the industry and inspire future advancements.