Years Active: 2025
Title: The Innovations of Daniel F Feezell
Introduction
Daniel F Feezell is an accomplished inventor based in Albuquerque, NM (US). He has made significant contributions to the field of semiconductor technology, particularly in the development of vertical-cavity surface emitting lasers (VCSELs). His innovative work has led to the granting of a patent that showcases his expertise and creativity.
Latest Patents
One of Daniel F Feezell's notable patents is titled "Non-c-plane group III-nitride-based VCSELs with nanoporous distributed Bragg reflector mirrors." This patent describes an electrically injected VCSEL and a method of manufacturing the same. The invention includes a non-c-plane substrate and a nanoporous bottom distributed Bragg reflector (DBR) that comprises a plurality of alternating highly doped III-nitride layers and unintentionally doped III-nitride layers formed above the substrate. This advancement has the potential to enhance the performance and efficiency of VCSELs in various applications.
Career Highlights
Throughout his career, Daniel F Feezell has demonstrated a commitment to innovation and excellence in his field. His work has not only contributed to the advancement of technology but has also paved the way for future research and development in semiconductor devices. With a patent portfolio that includes 1 patent, he continues to be a prominent figure in the industry.
Collaborations
Daniel has collaborated with several talented individuals in his research endeavors. Notable coworkers include Morteza Monavarian and Saadat M Mishkat-Ul-Masabih, who have contributed to the success of his projects and innovations.
Conclusion
In summary, Daniel F Feezell is a distinguished inventor whose work in the field of VCSEL technology has led to significant advancements. His patent on non-c-plane group III-nitride-based VCSELs highlights his innovative spirit and dedication to improving semiconductor technology.