Company Filing History:
Years Active: 2006-2012
Title: The Innovations of Daniel E Partin
Introduction
Daniel E Partin is a notable inventor based in Hillsboro, OR (US). He has made significant contributions to the field of semiconductor technology, holding a total of 4 patents. His work focuses on analyzing defects in semiconductor wafers, which is crucial for the fabrication process in semiconductor manufacturing.
Latest Patents
One of his latest patents is the Defect Analyzer. This invention provides methods, devices, and systems for analyzing defects in objects such as semiconductor wafers. The process begins with inspecting the semiconductor wafers to locate defects. The locations of these defects are stored in a defect file. A dual charged-particle beam system is then automatically navigated to the vicinity of the defect location using the information from the defect file. The defect is identified, and a charged particle beam image is obtained for further analysis. A recipe is determined for additional analysis, which is executed to cut a portion of the defect using a charged particle beam. Finally, the surface exposed by the charged particle beam cut is imaged to gather more information about the defect.
Career Highlights
Daniel E Partin works at FEI Company, where he has been instrumental in advancing semiconductor technology. His innovative approaches have helped improve the efficiency and accuracy of defect analysis in semiconductor fabrication.
Collaborations
Some of his notable coworkers include Janet Teshima and James Edgar Hudson. Their collaborative efforts contribute to the ongoing advancements in the field of semiconductor technology.
Conclusion
Daniel E Partin's contributions to semiconductor technology through his patents and work at FEI Company highlight his importance as an inventor. His innovative methods for defect analysis are paving the way for advancements in the semiconductor industry.