Sayreville, NJ, United States of America

Daniel E Lee

This inventor holds 1 USPTO granted patent. Top assignee: Merck Sharp & Dohme LLC. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Daniel E Lee. Retrieved from https://idiyas.com/inventor/daniel-e-lee

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Daniel E. Lee: Inventor in Analytical Chemistry

Introduction

Daniel E. Lee is an inventor based in Sayreville, New Jersey, whose patent work addresses the sensitive detection of semi-volatile nitrosamines in solid samples. His invention describes an analytical method designed to reduce the risk of nitrosamines forming during sample preparation and to support rapid detection.

Latest Patents

Lee is associated with 1 patent: “Method for Analyzing Trace Levels of Semi-Volatile Nitrosamines in Solid Samples.” The method involves preparing a nitrosamine sample and adding relevant chemicals to reduce or eliminate in situ nitrosamine formation. It then uses full evaporation static headspace gas chromatography coupled with a nitrogen-phosphorus detector (FE-SHSGC-NPD) to analyze the gaseous phase. The approach is intended to enable sensitive detection of semi-volatile nitrosamines, including NDMA.

Career Highlights

Lee’s patent reflects work on analytical techniques for detecting trace contaminants in solid samples. He is associated with Merck Sharp & Dohme LLC.

Collaborations

Rebecca Evans and Xinxin Han are identified as Lee’s coworkers. The provided information does not specify their roles in the patent or the invention.

Conclusion

Daniel E. Lee’s patent describes a method for reducing sample-preparation artifacts and detecting semi-volatile nitrosamines, including NDMA, through headspace gas chromatography and nitrogen-phosphorus detection.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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