Midland, MI, United States of America

Daniel David Lecloux

This inventor holds 1 USPTO granted patent. Top assignee: Lg Chem, Ltd. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Daniel David Lecloux. Retrieved from https://idiyas.com/inventor/daniel-david-lecloux-obtwu6i2

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: The Innovations of Daniel David Lecloux

Introduction

Daniel David Lecloux is an accomplished inventor based in Midland, MI (US). He has made significant contributions to the field of electronic applications through his innovative work with deuterated compounds. His expertise and creativity have led to the development of technologies that enhance electronic devices.

Latest Patents

Daniel holds a patent for "Deuterated Compounds for Electronic Applications." This invention relates to deuterated aryl-anthracene compounds that are useful in electronic applications. It also pertains to electronic devices in which the active layer includes such a deuterated compound. His work in this area showcases his ability to merge chemistry with technology to create practical solutions.

Career Highlights

Daniel is currently employed at LG Chem, Ltd., where he continues to push the boundaries of innovation. His role at the company allows him to collaborate with other talented professionals in the field. His dedication to research and development has positioned him as a key player in the advancement of electronic materials.

Collaborations

Throughout his career, Daniel has worked alongside notable colleagues such as Adam Fennimore and Weiying Gao. These collaborations have fostered a creative environment that encourages the exchange of ideas and the pursuit of groundbreaking inventions.

Conclusion

Daniel David Lecloux exemplifies the spirit of innovation in the field of electronic applications. His contributions through his patent and collaborations highlight his commitment to advancing technology. His work continues to inspire future developments in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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