San Jose, CA, United States of America

Daniel C Reda

This inventor holds 4 USPTO granted patents. Top assignee: The United States of America as Represented by the Administrator of the. Active years: 1994-1995.


% Patents Active = 100.0

Average Co-Inventor Count = 1.6

ph-index = 3

Forward Citations = 35(Granted Patents)


Company Filing History:


Years Active: 1994-1995

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4 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Daniel C Reda

Introduction

Daniel C Reda is a notable inventor based in San Jose, CA (US). He has made significant contributions to the field of surface shear stress measurement, holding a total of 4 patents. His work focuses on innovative methods that enhance the understanding and measurement of shear stress in various applications.

Latest Patents

One of his latest patents is a method for measuring surface shear stress magnitude and direction. This method involves covering a surface with a shear stress-sensitive liquid crystal coating and illuminating it with white light from a normal direction. A video camera is positioned at an oblique angle to observe the color of the liquid crystal, allowing for the determination of shear magnitude and direction based on the color information. Another significant patent is a method for determining shear direction using liquid crystal coatings. In this method, a beam of white light is directed onto the surface of a liquid crystal coating, causing the light to disperse into a spectrum of colors. The system is calibrated by positioning an observer, such as a video camera, to identify a reference color band. The rotation of the reflected spectrum, caused by shear, allows for the determination of shear direction based on the observed color band.

Career Highlights

Daniel C Reda has dedicated his career to advancing the field of shear stress measurement. His innovative approaches have led to practical applications in various industries, enhancing the accuracy and reliability of measurements.

Collaborations

Throughout his career, Daniel has collaborated with notable colleagues, including Scott D Martinson and David L Gray. These collaborations have contributed to the development of his patented methods and have fostered a productive research environment.

Conclusion

Daniel C Reda's contributions to the field of surface shear stress measurement are significant and impactful. His innovative patents demonstrate a commitment to advancing technology and improving measurement techniques. His work continues to influence the industry and inspire future innovations.

Profile summary based on public USPTO records.
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