Paarl, Canada

Daniel Barend Rademeyer


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Innovator Spotlight: Daniel Barend Rademeyer

Introduction

Daniel Barend Rademeyer, an accomplished inventor based in Paarl, California, has made notable contributions to the field of charge transfer measurement techniques. With a keen focus on enhancing such measurement methods, Rademeyer's innovative work is significant in advancing technology within his industry.

Latest Patents

Rademeyer holds one patent titled "Advanced Charge Transfer Measurement Techniques." This invention is directed at improving charge transfer-based measurement techniques. It involves utilizing a sigma-delta-like sensing circuit that continuously removes a specific amount of charge from an accumulator, producing a binary bit output stream that reflects the state of a connected sensor. Additional techniques include detecting charge transfer measurement residuals through controlled, multi-step charge removal until a trip event is cleared, along with reusing a voltage threshold through various charge transfer measurements of different resolutions.

Career Highlights

Rademeyer is currently associated with Azoteq Holdings Limited, where he applies his expertise to develop innovative solutions. His work highlights the intersection of technology and measurement, focusing on enhancing accuracy and efficiency in electronic sensing.

Collaborations

Throughout his career, Rademeyer has collaborated with talented professionals including Frederick Johannes Bruwer and Nico Johann Swanepoel. These collaborations have played an essential role in pushing the boundaries of inventiveness and technological advancement in their field.

Conclusion

Daniel Barend Rademeyer's contributions to the domain of charge transfer measurement techniques exemplify the spirit of innovation. His patent reflects a dedication to improving existing methods, and his collaborations with skilled colleagues further enhance the potential impact of his work within the technology landscape.

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