Bay City, MI, United States of America

Daniel A Gokey

This inventor holds 1 USPTO granted patent. Top assignee: The Dow Chemical Company. Active years: 1988.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Daniel A Gokey. Retrieved from https://idiyas.com/inventor/daniel-a-gokey

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 1988

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Daniel A. Gokey

Introduction

Daniel A. Gokey is an accomplished inventor based in Bay City, MI (US). He has made significant contributions to the field of electroplating through his innovative patent. His work exemplifies the intersection of engineering and practical application in manufacturing processes.

Latest Patents

Gokey holds a patent for a device and method for electroplating a workpiece having axial symmetry. This invention involves a unique approach where the workpiece, acting as the cathode, is rotated within an anode structure submerged in a plating solution. The design allows for part of the rotating cathode to continuously move through regions of intense current flux, enhancing the plating rate while also controlling the deposition process.

Career Highlights

Daniel A. Gokey is associated with The Dow Chemical Company, where he applies his expertise in electroplating technologies. His innovative approach has contributed to advancements in manufacturing processes, particularly in the production of metal workpieces with axial symmetry.

Collaborations

Gokey has worked alongside his coworker, Mani Shabrang, to further develop and refine his electroplating techniques. Their collaboration highlights the importance of teamwork in driving innovation within the industry.

Conclusion

Daniel A. Gokey's contributions to electroplating technology demonstrate his commitment to innovation and excellence in engineering. His patent reflects a significant advancement in the field, showcasing the potential for improved manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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