Nanjing, China

Danian Shi

This inventor holds 1 USPTO granted patent and 3 published patent applications and 2 EPO patents. Top assignee: Huawei Technologies Co., Limited. Active years: 2020.

USPTO Granted Patents = 1 

% Patents Active = 100.0

 

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2020

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Danian Shi

Introduction

Danian Shi is a prominent inventor based in Nanjing, China. He has made significant contributions to the field of technology, particularly in delay measurement systems. His work is characterized by a focus on simplifying complex implementations, which has practical applications in various technological domains.

Latest Patents

Danian Shi holds a patent for a "Method, apparatus, and system for implementing delay measurement." This innovative method involves determining delays generated during packet transmissions over loopback paths. The process includes measuring delays T0 and T1, which allows for accurate delay measurement through a streamlined measurement function. This invention addresses the challenges associated with complex implementations in delay measurement.

Career Highlights

Danian Shi is associated with Huawei Technologies Co., Limited, a leading global provider of information and communications technology (ICT) infrastructure and smart devices. His role at Huawei has allowed him to contribute to cutting-edge technological advancements and innovations.

Collaborations

Danian has collaborated with notable colleagues, including Guoping Li and Xiaoyang Xu. Their teamwork has fostered an environment of innovation and creativity, leading to impactful technological developments.

Conclusion

Danian Shi's contributions to delay measurement technology exemplify the importance of innovation in simplifying complex systems. His work continues to influence the field and showcases the potential for advancements in technology.

Profile summary based on public USPTO records.
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