Company Filing History:
Years Active: 2016-2017
Title: The Innovative Contributions of Dana Sauter Van Ness
Introduction
Dana Sauter Van Ness, an inventive engineer based in Forest Park, IL, has made significant strides in the field of chemical-mechanical polishing compositions. With a total of three patents to her name, Dana's innovations focus on enhancing the efficiency and effectiveness of polishing techniques, particularly for substrates with silicon oxide layers.
Latest Patents
Dana's most recent patents include two notable inventions centered around polishing compositions. The first patent describes a polishing composition containing ceria abrasive. This innovative formulation features wet-process ceria particles with a median particle size ranging from about 40 nm to about 100 nm. These particles are included at a concentration of about 0.005 wt. % to about 2 wt. % in an aqueous carrier, accompanied by a functionalized heterocycle and a pH-adjusting agent, resulting in a polishing composition with a pH of about 1 to about 6. Additionally, the patent outlines a method for polishing substrates, specifically those with a silicon oxide layer, using this composition.
The second patent pertains to a polishing composition that incorporates a cationic polymer additive. This formulation similarly utilizes wet-process ceria particles, which have a median particle size between 75 nm to 200 nm, present in the composition at a concentration of about 0.005 wt. % to about 2 wt. %. This innovation features first abrasive particles, a functionalized heterocycle, and a cationic polymer selected from options like quaternary amines or cationic polyvinyl alcohol. A pH-adjusting agent and an aqueous carrier are also included, resulting in a polishing composition that retains a pH of about 1 to about 6, and is designed for effectively polishing silicon oxide substrates.
Career Highlights
Dana Sauter Van Ness works at Cabot Microelectronics Corporation, a leading company in the field of advanced polishing solutions. Through her innovative work, she has contributed significantly to the development of high-performance polishing compositions that are critical in various manufacturing processes, particularly in the semiconductor industry.
Collaborations
Throughout her career, Dana has collaborated with esteemed colleagues such as Brian Reiss and Viet Lam. These collaborations have not only enriched her work but have also fostered an environment of shared innovation and creativity, allowing for diverse perspectives in problem-solving and invention.
Conclusion
Dana Sauter Van Ness stands out as a remarkable inventor whose contributions have had a lasting impact on the field of chemical-mechanical polishing. Her innovative spirit is reflected in her patents that continue to advance technological processes in industries reliant on precision and efficacy. As an inventor, Dana exemplifies the importance of research and development in creating solutions that meet the ever-evolving demands of modern manufacturing.