Company Filing History:
Years Active: 2024
Title: The Innovative Contributions of Dan Kitajima
Introduction
Dan Kitajima is a notable inventor based in Niwa-Gun, Japan. He has made significant contributions to the field of engineering, particularly in the development of crimping technologies. With a total of 2 patents to his name, Kitajima's work showcases his dedication to innovation and problem-solving.
Latest Patents
Kitajima's latest patents include a crimp securing structure of a bolt and a device and method for fixing a nut to the inner surface of a pipe member. The crimp securing structure involves a crimp bolt with a crimping recess on the upper surface of the head, which is crimped onto a metal sheet. This design features a unique thickness variation in the metal material press-fitted into the crimping recess, allowing for enhanced performance. The crimping die used in this process includes a stress-relief recess to prevent excessive local stress during crimping. His second patent addresses the challenge of fixing a nut to the inner surface of a pipe member with a small inner diameter. This device includes a unit box that can be inserted into the pipe, a rotation shaft extending outside the pipe, and a cam that facilitates the advancement of a nut holder towards the inner surface of the pipe.
Career Highlights
Dan Kitajima is associated with Aoyama Seisakusho Co., Ltd., where he continues to innovate and develop new technologies. His work has been instrumental in advancing the capabilities of crimping methods and devices, making significant impacts in various applications.
Collaborations
Kitajima has collaborated with talented coworkers such as Kazuhiro Koga and Kenichiro Araki. Their combined expertise has contributed to the successful development of innovative solutions in their field.
Conclusion
Dan Kitajima's contributions to engineering through his patents and collaborative efforts highlight his role as a significant inventor in Japan. His innovative designs continue to influence the industry and pave the way for future advancements.