Dan Joseph Healy

Title: Dan Joseph Healy: Inventor in Semiconductor Process Technology

Introduction

Dan Joseph Healy is an inventor based in Morgan Hill, California, whose patent work includes methods for monitoring and calibrating flow controllers used with process chambers. He is associated with Applied Materials, Inc. His portfolio includes 3 patents.

Latest Patents

One of Healy’s latest listed inventions is titled “Methods for Monitoring a Flow Controller Coupled to a Process Chamber.” The patent description concerns methods and apparatus for calibrating a flow controller in situ.

The disclosed method uses a relationship between a flow controller’s setpoint and the flow rate of a standard gas to establish an initial reference. It then determines the actual relationship for a first gas by measuring flow rates at multiple corresponding setpoints. The controller can use that actual relationship to deliver the first gas at a desired flow rate. This approach is intended to improve flow control by accounting for the behavior of the gas being used.

Career Highlights

Healy’s patent work addresses flow measurement and control in semiconductor processing environments. In-situ calibration can help a process chamber’s flow controller account for differences between gases and support more accurate delivery during operation.

Collaborations

Healy is associated with Applied Materials, Inc., a company active in semiconductor manufacturing equipment and process technology. His listed coworkers include John William Lane and Mariusch Gregor.

Conclusion

Dan Joseph Healy’s patent work focuses on practical methods for calibrating and monitoring gas flow controllers in process chambers, contributing to the broader field of semiconductor manufacturing technology.