Bannewitz, Germany

Damir Muchamedjarow

This inventor holds 1 USPTO granted patent. Top assignee: Von Ardenne Asser Gmbh &Co. Kg. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Damir Muchamedjarow. Retrieved from https://idiyas.com/inventor/damir-muchamedjarow-t9cvpotb

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Damir Muchamedjarow: Innovator in Coating Process Control

Introduction

Damir Muchamedjarow is a notable inventor based in Bannewitz OT Haenichen, Germany. He has made significant contributions to the field of coating processes, showcasing his expertise through innovative methods and devices.

Latest Patents

Muchamedjarow holds a patent for "Methods, devices, and code for controlling a coating process." This patent focuses on controlling a coating process of a substrate. The method involves driving a first actuator that supplies the coating process based on monitored process variables detected in parallel. Additionally, it includes driving a second actuator that also relies on these monitored variables, ensuring precise control over the coating process. He has 1 patent to his name.

Career Highlights

Damir Muchamedjarow is associated with Von Ardenne Asser GmbH & Co. KG, where he applies his innovative ideas to enhance coating technologies. His work has been instrumental in advancing the efficiency and effectiveness of coating processes.

Collaborations

Muchamedjarow collaborates with talented professionals in his field, including Martin Langer and Ralf Biedermann. Their combined expertise contributes to the development of cutting-edge solutions in coating technology.

Conclusion

Damir Muchamedjarow stands out as an inventor dedicated to improving coating processes through innovative methods and devices. His contributions are paving the way for advancements in this critical area of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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