Company Filing History:
Years Active: 1992
Title: Dalton Chen - Innovator in Photoresist Technology
Introduction
Dalton Chen is a notable inventor based in Santa Clara, CA (US). He has made significant contributions to the field of photoresist technology, particularly with his innovative patent related to resist stripping.
Latest Patents
Dalton Chen holds 1 patent for a positive photoresist stripper composition. This composition includes a solvent system with solubility parameters ranging from about 8.5 to about 15, comprising 65% to 98% of the total composition. Additionally, it contains an amine in the range of 2% to 25% and a fatty acid with 8 to 20 carbon atoms, present in amounts from about 0.1% to about 10%. The specific amounts of the amine and fatty acid are carefully selected to achieve a pH between 6 and 9.5. This innovative composition allows for the effective stripping of positive photoresist from substrates without affecting the metal deposited on them.
Career Highlights
Dalton Chen is currently employed at Ardrox Inc., where he continues to develop and refine technologies in the field of photoresist applications. His work has positioned him as a key player in advancing the capabilities of photoresist stripping processes.
Collaborations
Dalton collaborates with talented coworkers, including Wei-Yuan Lin and Noor U Haq, who contribute to the innovative environment at Ardrox Inc. Their combined expertise fosters a culture of creativity and technological advancement.
Conclusion
Dalton Chen's contributions to photoresist technology exemplify the impact of innovation in the field. His patent for a positive photoresist stripper composition showcases his commitment to advancing industry standards and practices.